刘海军
个人信息Personal Information
副教授
硕士生导师
教师拼音名称:liuhaijun
入职时间:2016-10-24
所在单位:机械制造工程系
学历:研究生(博士)毕业
性别:男
学位:工学博士学位
在职信息:在职
毕业院校:大连理工大学
学科:机械设计及理论
机械电子工程
机械工程其他专业
机械制造及其自动化
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集成电路产业是基础性、先导性和战略性产业,为了提高芯片性能与封装密度,发展三维封装技术,要求对晶圆进行减薄加工。减薄加工中产生的损伤导致晶圆产生翘曲变形,将会增加晶圆在传输和后续加工中的碎片率。晶圆变形是评价硅片加工质量的重要技术指标,也是分析晶圆加工残余应力、优化减薄工艺的重要依据。从晶圆整体变形求解残余应力入手,研究残余应力与亚表面损伤的映射关系,建立晶圆整体变形评价减薄加工工艺的方法,实现半导体晶圆的精密低损伤制造。
- Liu Haijun,Dong Zhigang,Huang Han,Kang Renke,Zhou Ping,A new method for measuring the flatness of large and thin silicon substrates using a liquid immersion technique:Measurement Science and Technology,2015
- Liu Haijun,Zhu Xianglong,Kang Renke,Dong Zhigang,Chen Xiuyi,Three-point-support method based on position determination of supports and wafers to eliminate gravity-induced deflection of wafers:Precision Engineering,2016,46):339-348.
- Liu Haijun,Han Jiang,Tian Xiaoqing,Dong Fangfang,Chen Shan,Lu Lei,Accurate determination of bifurcation points for ground silicon wafers considering anisotropy using FEM method:Materials Research Express,2019,6(9
- Liu Haijun,Zhou Jing,Tian Xiaoqing,Han Jiang,Chen Shan,Lu Lei,Evaluation of polishing-induced subsurface damage based on residual stress distribution via measured global surface deformation for thinned silicon wafers:Surface Topography: Metrology and Properties,2021,9(3