杨之青  (副教授)

硕士生导师

电子邮箱:

入职时间:2022-01-03

所在单位:电气工程系

职务:学院外事秘书

学历:研究生(博士)毕业

办公地点:逸夫楼603

性别:男

联系方式:zhiqing.yang@hfut.edu.cn

学位:博士学位

在职信息:在职

毕业院校:德国亚琛工业大学

学科:电力电子与电力传动

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Digital Close-Loop Active Gate Driver for Static and Dynamic Current Sharing of Paralleled SiC MOSFETs

点击次数:

影响因子:4.6

DOI码:10.1109/JESTPE.2023.3287576

发表刊物:IEEE Journal of Emerging and Selected Topics in Power Electronics

关键字:Current control, digital control, gate drivers, semiconductor device reliability, wide band gap semiconductors

摘要:Silicon carbide (SiC) power devices have been extensively for high-power-density application scenarios. To increase the current rating, SiC devices are usually connected in parallel. However, the mismatching current brought by unbalanced electrical parameters can increase the current stress of a device and pose a reliability concern for the converter system. Aiming at addressing the current imbalance for paralleled SiC devices, this article reports the application of an improved active gate driver (AGD) on the paralleled SiC MOSFETs to address the current imbalance problems. The three-level driver voltage can minimize the overshoot voltage and current. The adjustable turn-on voltage and gate signal delay time can realize the current sharing of both static and dynamic processes. Current sensors and a digital controller are utilized for close-loop control. The functionality of the proposed AGD is validated in continuous operating experiments.

论文类型:期刊论文

学科门类:工学

文献类型:J

卷号:12

期号:2

页面范围:1372 - 1384

ISSN号:2168-6777

是否译文:

发表时间:2023-06-22

收录刊物:SCI

发布期刊链接:https://ieeexplore.ieee.org/xpl/RecentIssue.jsp?punumber=6245517

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