CN

Wang Jena

Associate professor

Supervisor of Master's Candidates

Date of Birth:1977-12-05

School/Department:电子科学系

Administrative Position:无

Education Level:Postgraduate (Doctoral)

Business Address:翡翠科教楼B509室

Gender:Female

Degree:Doctoral degree

Academic Titles:无

Other Post:无

Alma Mater:中国科学院固体物理研究所

Discipline:Microelectronics and Solid-state Electronics

Paper Publications

Plasma-Enhanced Si-SiC Low-Temperature Bonding Based on Graphene Composite Slurry Interlayer

Release time:2021-09-01 Hits:

Impact Factor:3.0

DOI number:10.1016/j.matlet.2021.129710

Journal:Materials Letters

Key Words:Graphene composite slurry;Low-temperature bonding;Sintering;Surfaces;Plasma treatment

Abstract:Recently, silicon carbide (SiC) has replaced silicon (Si) as a potential material for next-generation power devices. In this study, a Si-SiC low-temperature bonding method based on graphene composite slurry as an interlayer was developed. Ar plasma was used to treat the surfaces of Si and SiC to improve surface hydrophilicity for higher strength bonding. With the increase of discharge power, the root-mean -square (RMS) surface roughness of Si and SiC has obviously increased and the bonding quality was also greatly improved. For 70 W discharge power, the RMS surface roughness values of Si and SiC were 3.22 nm and 1.67 nm respectively, and the bonding strength reached approximately 10 MPa. Through SEM interface analysis, it can be found that a seamless bonding interface was obtained using this bonding process. (c) 2021 Elsevier B.V. All rights reserved.

Co-author:Jian-Kun Wan, Xiang Yin, Wen-Hua Yang, Chao Xie, Chun-Yan Wu, Li Wang, Lin-Bao Luo

First Author:Xi-Ming Ye

Correspondence Author:Wen-Hua Yang, Lin-Bao Luo

Document Type:Article

Volume:293

ISSN No.:0167-577X

Translation or Not:no

Date of Publication:2021-06-15

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