[3] C. Chen, Y. Zhou, W. Li, L. Liu, H. Gu, and S. Liu, “High throughput defect inspection and ptychographic review for EUV mask,” in AOPC 2022: Optical Sensing, Imaging, and Display Technology, Y. Wang, B. Xue, Y. Jiang, X. Wang, and D. Liu, Eds., SPIE, Jan. 2023, p. 70. doi: 10.1117/12.2651662.
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上一条： [2] C. Chen, H. Gu, and S. Liu, “Ultra-simplified diffraction-based computational spectrometer,” Light Sci. Appl., vol. 13, no. 1, pp. 1–10, Dec. 2024, doi: 10.1038/s41377-023-01355-4.
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